High Purity Titanium Sputtering Target
Process: CNC Machining; Vacuum melting
Ti Content: 99.99%
Usage: Titanium Thin Film For Coating
High Light: sputtering target, sputtering materials
Shape: Round,plate, tube or OEM size
Size:
Round: dia 25~250mm
Rectangular: length up to 1500mm
Proportion(wt%): 5-80 ± 0.2Ti at your request.
Application:
PVD coating
architectural glass, car using glass, graphic display field.
electronic and semiconductor field.
decoration and mould field.
